Effect of Reactor Pressure on the Electrical and Structural Properties of InN Epilayers Grown by High-pressure Chemical Vapor Deposition, Ananta R. Acharya, M.K. Indika Senevirathna, Sampath Gamage, Ramazan Atalay, Ananta R. Acharya, A. G. Unil Perera, Nikolaus Dietz, Max Buegler, Axel Hoffmann, Liqin Su, Andrew Melton, Ian Ferguson
Ananta R. Acharya